A breakthrough discovery is about to facilitate the semiconductor industry’s search to squash more information on chips to accelerate the performance of electronic devices. The semiconductor industry has been successful in its consistent efforts to reduce feature size on a chip. In this effort to help create faster, better and cheaper light sources for chips researches are developing laser-produced light sources for next generation Extreme Ultraviolet Lithography. This process would involve employing a long pulse in a CO2 laser system used in an EUVL source could make the system significantly more efficient, simpler and cheaper compared to that using in a shorter pulse.